The leading German deposition equipment provider Aixtron announced that Nano Carbon (Poland) has ordered AIXTRON’s AIX G5 WW reactor for graphene production on silicon carbide. Nano Carbon owns a low-cost patented technique for epitaxial graphene that can be implemented on the AIXTRON system.
The equipment was ordered in the first quarter of 2015 and is due for delivery by the fourth quarter. The system will be configured to handle either ten 100mm or six 150mm substrates per run. The AIX G5 WW equipment provides high wafer throughput and is designed for the ultra-high temperatures needed for epitaxial graphene on SiC deposition.
Nano Carbon stated that it will use the AIXTRON system to continue research on graphene on SiC and will commercialize this technology on to production scale using the AIX G5 WW.