PlanarTECH is a US-based company (with manufacturing in Korea) that offers economical process equipment, analytical equipment and training services for emerging 2D materials (graphene, boron nitride, molybdenum disulfide, etc.).
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Aixtron AG is a provider of deposition equipment to the semiconductor industry. The company's technology solutions are used to build advanced components for electronic and opto-electronic applications based on compound, silicon, or organic semiconductor materials.
Annealsys is a manufacturer of Rapid Thermal Processing (RTP) and Chemical Vapor Deposition (CVD) systems.
The company's systems offer multi-process capabilities in the same reactor, and besides graphene production units, the company also offers DLI-CVD system solutions for MoS2 deposition.
CVD Equipment Corporation (a US-based company) offers a variety of process and support equipment for both R&D and production facilities. CVD Equipment offers graphene production systems.
DrM Ag (Dr. Mueller), based in Switzerland, is a manufacturer of technically sophisticated filtration systems for solid/liquid separation for use in processing industries, with over 3,000 installations worldwide.
Moorfield is a UK based company, founded in 1989 that designs and manufacture a wide range of R&D-scale laboratory systems. The company focuses on vacuum deposition products and CDV synthesis.
MTI Corporation, based in California US, was established in 1994 and is a leading manufacturer of oxide crystals and substrates. The company also offers lab equipment and furnaces - and they have a range of tube furnaces for graphene growth.
Oxford Instruments is a leading provider of high technology tools and systems for research and industry. The company designs and manufactures equipment that can fabricate, analyse and manipulate matter at the atomic and molecular level, including CVD equipment for graphene production and various systems for metrology and testing.
Picosun, based in Espoo Finland, was established in 2004 to develop Atomic Layer Deposition (ALD) reactors for micro- and nanotechnology applications.
Primary Dispersions was founded in 2008 as a spin-out from the Centre for Process Innovation (CPI). Primary Dispersions Limited (PDL) has developed an advanced and disruptive milling technology (‘ConCor’) in collaboration with their technology partners, Maelstrom Advanced Process Technology (Maelstrom APT).