Adisyn has independently confirmed it can deposit graphene across a full 200mm industrial wafer at low temperature, below 300°C - a scale-up from the 1cm by 1cm coupon the company had previously demonstrated.
The deposition was tested at 12 sampling locations across the wafer and worked at all of them, covering an area roughly 300 times larger than that earlier coupon-level result. The low-temperature deposition, below 300°C, is significant because most existing semiconductor fabrication processes cannot tolerate the higher temperatures that traditional graphene growth methods typically require.
The 200mm wafer format is not the most advanced in the industry, but it's a widely used "workhorse" size across semiconductor manufacturing for analog chips, sensors, power devices and older logic nodes. Demonstrating graphene coverage at this scale moves the technology from a lab-scale sample to a format that matches what fabs actually process. Adisyn has flagged 300mm wafers - the leading-edge format used for AI accelerators, high-performance computing and advanced memory - as its next target.
Adisyn Managing Director Arye Kohavi noted that the milestone was reached ahead of the company's internal development schedule. The company still needs to demonstrate repeatability and defectivity data across multiple deposition runs, followed by device integration and customer qualification, before the result can translate into a signed partner or licensing revenue. Adisyn is targeting a capital-light commercial model based on licensing and joint development agreements, rather than building its own fabrication facility.
