Aixtron AG is a provider of deposition equipment to the semiconductor industry. The company's technology solutions are used to build advanced components for electronic and opto-electronic applications based on compound, silicon, or organic semiconductor materials.
For graphene development and production, Aixtron offers the BM Pro systems (previously called Black Magic systems). BM Pro systems can be used to deposit graphene using both chemical vapor deposition (CVD) and plasma enhanced chemical vapor deposition (PECVD).
Aixtron trades in the Frankfurt Stock Exchange, and in the NASDAQ Stock Exchange (AIXG).
The latest Aixtron graphene news:
The leading German deposition equipment provider Aixtron announced that Nano Carbon (Poland) has ordered AIXTRON’s AIX G5 WW reactor for graphene production on silicon carbide. Nano Carbon owns a low-cost patented technique for epitaxial graphene that can be implemented on the AIXTRON system.
The equipment was ordered in the first quarter of 2015 and is due for delivery by the fourth quarter. The system will be configured to handle either ten 100mm or six 150mm substrates per run. The AIX G5 WW equipment provides high wafer throughput and is designed for the ultra-high temperatures needed for epitaxial graphene on SiC deposition.
US researchers and Aixtron engineers grew high-quality 300 mm graphene on copper-coated silicon wafers
Researchers from the University of Texas at Austin, in collaboration with Aixtron developed a new method to grow high-quality wafer-scale (300 mm) graphene sheets. This process may enable the integration of graphene with Silicon CMOS and pave the way towards graphene-based electronics.
The method is based on CVD growth on polycrystalline copper film coated silicon substrates. They report that their graphene has better charge carrier transport characteristics compared to previously synthesized poly- or single-crystalline wafers. The graphene has few defects and covers over 96% of the 300-mm wafer substrate.
Aixtron announced today that Saudi Arabia's King Abdullah University of Science and Technology (KAUST) has ordered an AIX BM plasma-enhanced CVD system to support their graphene and carbon nanotubes research. The reactor can handle 4" substrates and Aixtron will deliver it in Q3 2014.
This is KAUST's first BM Pro system, which will be used to expand their graphene research with an aim to find a "wide range of new applications".
Aixtron announced today that Shanghai University ordered a BM R&D reactor that will be used for graphene and CNT research at the University's Sino-Sweden Microsystem Integration Technology Center (SMIT).
The University researchers will use this new reactor for their research into CNT and graphene application using thermal- and plasma-based chemical vapor deposition (CVD). The researchers aim to develop next generation thermal interface/dissipating materials, heat spreaders, multi-chip interconnects and through silicon vias (TSV) for semiconductor chip packaging.
Aixtron is a key partner in several graphene research projects, extends their portfolio to include more 2D materials
Aixtron reported today that the company is involved with several European graphene research projects. In fact, Aixtron says they are a key-partner in several EU projects. First of all, Aixtron is leading Production Work Package in the Graphene Flagship, EU's $1 billion graphene drive.
In the GRAFOL project, Aixtron applies their scaling know-how to develop large scale equipment for wafer-based graphene and continuous production of foil-based graphene for transistors and transparent conductive films. In another project called MEM4WIN Aixtron employs their batch-based deposition technology to improve the throughput of graphene production for smart windows.