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CVD Equipment Corporation (a US-based company) offers a variety of process and support equipment for both R&D and production facilities. CVD Equipment offers graphene production systems.

In August 2013 CVD announced it will jointly develop graphene-based Li-Ion battery electrodes with Graphene Batteries.

CVD Equipment is a public company, trading in the NASDAQ (ticker: CVV).

Company Address: 
355 South Technology Drive
Central Islip, NY 11722
United States



The latest CVD Equipment graphene news:

The Italian CNR-IMM orders an AIXTRON BM Pro system

Aixtron, a leading global provider of deposition equipment to the semiconductor industry, has announced that the Institute for Microelectronics and Microsystems of the Italian National Research Council (CNR-IMM) in Catania, Italy, has purchased a BM Pro system in a 6-inch wafer configuration.

The equipment will be used to produce carbon nanotubes and graphene for the WATER (“Winning Applications of Nano Technology for Resolutive Hydropurification”) project, focused on the use of nanomaterials for water purification. In particular, the research is investigating carbon nanostructures, such as nanotubes and graphene, that have turned out to be the most promising nanomaterials for such applications. 

New facility for graphene manufacture and R&D launched by The University of Granada

The University of Granada in Spain has launched the Graphene and 2D Semiconductors Laboratory, said to be one of the most complete public laboratories devoted to the manufacture and electric and structural characterization of graphene in Europe. This laboratory is supposedly comparable to that of the University of Cambridge (United Kingdom) or the one in the University of Stanford (United States).

The new facilities are located in the UGR Research Centre for Information Technology and Communication. With an investment of more than half a million euros, the new laboratory is devoted to the manufacture of all kinds and forms of graphene as well as the development of new graphene-based systems for electronic applications which include biosensors, electronic nanodevices for IoT (Internet of Things) applications, and flexible electronics, in addition to wearable devices.

NRL and University College purchase Oxford Instruments' CVD equipment

The U.S Naval Research Laboratory (NRL) and University College, London, recently purchased Oxford Instruments' plasma processing Nanofab equipment using CVD, PECVD and ICPCVD techniques. 

The Nanofab enables the fabrication of nanostructured materials such as graphene, carbon nanotubes and other 1D and 2D nanomaterials. It combines several essential features for high performance growth such as a high temperature heater capable of processing up to 200 mm wafers, shower head technology, automatic load lock for wafer handling as well as flexible options for liquid/solid precursor delivery.

Preheating gas precursors enhances CVD graphene production

Researchers from Israel's Bar Ilan University discovered that preheating the gas precursors in atmospheric-pressure CVD graphene production results in 100% reproducibility, and higher quality graphene sheets.

The role of preheating in graphene CVD growth

The researchers say that the graphene produced in the new method required a lower processing temperature and exhibited 50% less defects compared to graphene made without gas preheating. In addition, all experiments (100% reproducibility) performed with gas heating led to "acceptable quality" graphene - compared to only 15% of the experiments performed without gas preheating.

Aixtron to supply a reactor to Nano Carbon (Poland)

The leading German deposition equipment provider Aixtron announced that Nano Carbon (Poland) has ordered AIXTRON’s AIX G5 WW reactor for graphene production on silicon carbide. Nano Carbon owns a low-cost patented technique for epitaxial graphene that can be implemented on the AIXTRON system.

The equipment was ordered in the first quarter of 2015 and is due for delivery by the fourth quarter. The system will be configured to handle either ten 100mm or six 150mm substrates per run. The AIX G5 WW equipment provides high wafer throughput and is designed for the ultra-high temperatures needed for epitaxial graphene on SiC deposition.

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