This position calls for a highly ambitious, target oriented, self-driven and strong team player candidate with demonstrated expertise in one of the following areas:
1. Advanced CMOS microfabrication and cleanroom expertise using: Atomic Layer Deposition, sputtering, e-beam and thermal evaporation, Reactive Ion Etching, Photo- and laser writing lithography, SEM and AFM inspection etc.
2. Advanced expertise in large area graphene processing including wet and dry transfer, patterning, cleaning and growth. Expertise in surface modification of substrates for graphene adhesion and control of its electronic properties will be considered a plus.
The candidate will have the unique opportunity to be part of a team whose mission is to develop the first high performance optoelectronic prototypes enabled by graphene and its integration with CMOS electronics with emphasis on image sensors and flexible wearable sensor technologies.
REQUIREMENTS AND CONDITIONS
Candidates must hold an internationally-recognized Ph.D.-equivalent degree (or evidence of its completion in the nearest future), preferably in electrical/electronic engineering or physics. Candidates with an MSc degree in electronics or electrical engineering will also be considered, in which case they must have demonstrated at least 2-year experience and hands-on expertise in the aforementioned areas.
The contract is offered initially for a period of one year.
No restrictions of citizenship or gender apply to the ICFO positions.