New technique enables ultrafast 2D nanosheet assembly
Researchers from Nagoya University, Osaka University and National Taiwan University recently developed a method for the high-speed, large-area deposition of two-dimensional (2D) materials, including oxides, graphene oxide, and boron nitride. This innovative technique, known as the "spontaneous integrated transfer method," was discovered by chance; however, it could significantly improve the production of nanosheets.
Traditionally, methods like chemical vapor deposition (CVD) and the Langmuir-Blodgett (LB) technique have been employed for nanosheet fabrication. However, these methods have significant disadvantages, including difficulties in achieving uniform, large-area deposition and complications in the substrate transfer process. Aiming to develop a more effective deposition technology, the research team discovered a fascinating phenomenon completely by chance: when nanosheets get wet, they spontaneously align themselves on the surface of water, forming dense films within a mere 15 seconds. This process, termed the "spontaneous spreading phenomenon," suggested a more effective deposition technology.