Aixtron announced today that the BM 300 system was installed at the the National Institute of Advanced Industrial Science and Technology (AIST) in Japan. AIST purchased the system back in April 2011. The system was installed in 2011 in AIST’s super clean room facility in Tsukuba and was commissioned by the local Aixtron support team.
AIST reports that they managed to produce monolayer graphene on 300 mm wafers using the new system. AIST will use the system to deposit high-quality graphene with a controlled number of layers. This will be a key part of a process technology used for creating low-voltage operation CMOS FETs, in which the power supply voltage will be less than 0.3V.
Posted: Apr 11,2012 by Ron Mertens