Picosun manages to deposit high-quality graphene using ALD technology

Picosun logoIn January 2014, the EU launched a new project in which Picosun aimed to utilize their ALD technology to deposit graphene. Now the company announced that it successfully managed to deposit graphene using its PICOPLASMA remote plasma source system, in low temperature (400 degree Celsius).

Picosun collaborated with Xi'an Jiaotong University on this project, and they say that this is a breakthrough achievement that will enable ALD deposition of high quality graphene for many applications. ALD deposition enables the integration of graphene into semiconductor technologies for possible microelectronic device applications.

Posted: Oct 03,2014 by Ron Mertens