Graphenea logoGraphenea is a private European company (based in Spain) focused on the production of high quality graphene for industrial applications. The company produces single-layer graphene sheets, bi-layer graphene, multi-layer graphene, graphene oxide and other materials - on any substrate the customer provides.

In November 2012 the company launched an online store. In 2015, the company announced plans to construct a new graphene pilot plant in a $2.5 million investment.

Company Address: 
Tolosa Hiribidea 76
20018 Donostia-San Sebastian Guipúzcoa
Spain

The latest graphene news from Graphenea:

Graphenea GFAB: Graphene Foundry Service Launched

This is a sponsored post by Graphenea

Graphenea recently launched a graphene foundry service – GFAB. The company will manufacture custom circuit designs on graphene wafers up to 6”. The service is aimed at enabling fast device prototyping and accelerating development of new applications, lowering entry barriers to graphene-based solutions.

Graphenea states that in view of the market demands, the offer now includes small batch sizes (1-3 wafers). Lithography masks can be manufactured by Graphenea or provided by the customer. GFAB includes graphene growth, transfer on 4” and 6” wafers, metal contact deposition and lift-off, and graphene lithography with etching.

Graphenea, AMO and Emberion to take part in a bringing graphene short-wave infrared (SWIR) detectors to market

Graphenea, AMO and Emberion have been approved a European Innovation Council Fast Track to Innovation (FTI) project to help bring to market the G-IMAGER, a graphene imager based on graphene-on-wafer technology. The G-Imager is a short-wave infrared (SWIR) detector for applications in semiconductor inspection, sorting systems, spectroscopy hyperspectral imaging and surveillance.

Graphenea, AMO and Emberion to take part in a bringing graphene short-wave infrared (SWIR) detectors to market image

A major obstacle for wider use of SWIR imaging products is the high cost of SWIR detectors, which are currently primarily manufactured with InGaAs technology. The high price is related to the complex manufacturing of InGaAs that also prevents increase of the detector production volumes. Now Graphenea Semiconductor SL, Emberion Oy, and AMO GmbH are tasked with constructing and marketing the G-Imager which will bring the core price down significantly, allowing market volumes to grow substantially.

Graphene to enable next-gen reflective-type displays that operate faster and at much higher resolution than currently possible

A joint collaboration of researchers from SCALE Nanotech, Graphenea and TU Delft have used graphene to make reflective-type displays that operate faster and at much higher resolution than existing technologies.

Graphene to enable next-gen reflective-type displays that operate faster and at much higher resolution than currently possible image2500ppi GIMOD prototype showcased at the Mobile World Congress. Credit: Graphene Flagship

Displays consume the most power in electronic gadgets. Portable devices like smartphones and VR visors therefore require most of the energy from batteries. As an alternative solution, reflective-type displays (like those in e-book readers) consume much less power, though they cannot deliver video. Reflective displays that offer the specifications of standard technologies (OLED, LCD) do not exist yet, but graphene may open the door to such possibilities.

Graphenea launches new foundry service

Graphenea recently launched a graphene foundry service – GFAB. The company will manufacture custom circuit designs on graphene wafers up to 6”. The service is aimed at enabling fast device prototyping and accelerating development of new applications, lowering entry barriers to graphene-based solutions.

Graphenea launches new foundry service image

Graphenea states that in view of the market demands, the offer now includes small batch sizes (1-3 wafers). Lithography masks can be manufactured by Graphenea or provided by the customer. GFAB includes graphene growth, transfer on 4” and 6” wafers, metal contact deposition and lift-off, and graphene lithography with etching.

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